Isotropix Clarisse iFX v3.0 SP1 (Win/Mac) | 423/491MB​

Clarisse iFX is a new breed of high-end 2D/3D animation software which is the fusion of an animation package, a compositing software and a 3d rendering engine. It has been designed to streamline the workflow of CG artists to let them work and constantly interact on their final image with full effects on.

Rendering
All new physically based rendering engine
New physical lights, materials and volumes
New layered and composite materials
New multi-sample deformation and transformation motion blur
Rendering speed optimizations such as up to twice as fast to render volumes
Look Development

All new UDIM/UVTiles UV baking supporting AOVs and projection baking
Displacements support in Shading Layers
New Open Shading Language (OSL) texture pattern generation
New master input and texture bypass support
New texture coordinate space modes and alternate position support
New set of textures and math operators
Layout

New and revamped 3D manipulators
New item snapping tools
New density map based point cloud generation
ID based scattering and per scatterer decimation
Item selection locks and item isolation
Wireframe selection highlight in 3D View
User Interface

All new Texture View
Background/foreground plates support in 3D View
Improved Color Dialog with LUT support
Fully scriptable application menu bar and python commands log output
User-configurable units
3D View, Attribute Editor, Graph Editor and Material Editor improvements

What's new in Clarisse 3.0?
This new major release delivers many new and innovative features as well as a large number of enhancements throughout the entire application. New features and updates have been designed to bring a better user experience, improved workflow and productivity whether you're working as a solo artist or as part of a bigger team.

Highlights of Clarisse 3.0 include:
A brand new Physically Based Rendering (PBR) embodied in a new rendering engine, new sets of materials, lights and volume shaders all supporting multiple importance sampling (MIS)
A complete set of UV baking tools supporting UDIM/UVTiles and AOVs output
New scattering and layout tools along with importance-driven textured point cloud generation
New scriptable pattern generation using Open Shading Language (OSL)
Improved Color Management and support for CDL and many user interface improvements

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